Recently, a new type of UV direct lithography machine from the Institute of Optics and Fine Mechanics, Chinese Academy of Microelectronics dedicated equipment R & D team successfully developed in China. The device uses a unique high uniform, high collimation of UV lighting technology, combined with photosensitive glass materials, based on the photosensitive glass substrate to achieve direct processing of the fine structure can greatly simplify the process will effectively promote the photolithographic photosensitive fine structure of the photolithography process Technology "revolution", at present in the country has not seen the successful development of such products reported. Lithography equipment is the core equipment for the processing of fine structures and is fully used in the fields of microelectronics, biology, medicine and optics. Due to the limitation of lithography process, most of the original lithographic apparatus are developed for the technology of photoresist exposure. The microstructure of the glass substrate for the processing of particularities: the photosensitive properties of photosensitive glass is different from the photoresist, fine structure aspect ratio and completely non-contact exposure. In recent years, the micro-fabrication technology for glass substrates has become more and more important. There is an urgent need in the processing of new micro-structures such as microfluidic chips, micro-optical components and OLED displays, and is also one of the important directions for the research and development of lithographic apparatus at home and abroad. Therefore, the R & D team of Microelectronics Special Equipment Research and Development Institute of Photoelectric Technology Institute has carried out research and development on mercury lamp light sources, large-caliber high-precision mirrors, middle-UV coating and gap measurement, etc., and succeeded in raising the ultraviolet spectrum energy in the mercury lamp light sources , Through the reflective light path structure to ensure the utilization and collimation of light energy, precision gap measurement and control technology to achieve non-contact exposure, and direct photolithography photolithography experiments to achieve a high-resolution glass substrate, high aspect ratio, large area Micro-structure of the direct lithography process. The successful development of this equipment is a product of the combination of lithography equipment development and lithography application, which will promote the revolutionary improvement of lithography process, accord with the development trend of international lithography equipment research and make our country develop new type of direct lithography equipment Seize the opportunities.
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